EUV lithography is an advanced semiconductor manufacturing technique that uses 13.5 nm extreme ultraviolet light to etch extremely small patterns on silicon wafers. It is essential for leading-edge chips because older lithography methods cannot reliably print the smallest transistor features needed for the most advanced processors.
In cyber security, EUV matters because chip manufacturing capability shapes who can produce cutting-edge hardware for AI, encryption, and high-performance computing. It also affects supply-chain risk: access to EUV tools, materials, and maintenance software can be restricted, monitored, or targeted by espionage and sabotage. Defenders care about this technology when assessing vendor trust, export-control exposure, factory resilience, and the integrity of the systems that control fabrication equipment. While attackers rarely touch EUV directly, they may target the surrounding ecosystem—engineering networks, design files, logistics, or industrial control systems—to disrupt production or steal sensitive process know-how.